Silicon oxynitride film characteristics

At present, the silicon oxynitride thin film has been studied for many times, especially the process of preparing silicon oxynitride using CVD technology is quite mature, but the temperature prepared by atmospheric pressure chemical vapor deposition (PAcvD) is generally not lower than 805°C, and The research on the properties of silicon oxynitride is mainly concentrated on the photoelectricity. The Zzx4 rotary vane vacuum pump is used to fill the high-purity Yao. The protection is heated to the reaction temperature, and then the reaction gas is passed to the mixing chamber in proportion. When the gas is mixed to a certain pressure, the reaction gas is discharged from the mixing chamber at a certain flow rate to the reactor for reaction.

After the end of the reaction, cool down to 2°C in Yao. With the increase of the ratio of S/i flow rate in N-field, the hardness of the membrane gradually decreases. This is due to the increase of the ratio of NH3/is flow, the flow of iS residual gas in the mixed gas becomes smaller, so that the thickness of the membrane decreases, impeding The pressure of the indenter is reduced.

The results obtained show that the iSON film can effectively increase the surface hardness of the flat glass and improve the anti-wear performance of the flat glass. In recent years, Zhejiang University uses the wonderful CVD method at a low temperature (thus, by controlling the preparation process to deposit a silicon oxynitride film of a suitable thickness and reducing sample contamination, it is possible to use the film while maintaining the original optical properties of the plate glass. The high hardness improves the surface quality of the plate glass and expands the application range.

(l) After the silicon oxynitride film was formed on the surface of the flat glass, the hardness increased from 6 SGPa to 9.7 GaP, and the hardness increased by 40%.

(2) The silicon oxynitride film has good oxidation resistance in air, and only a slight oxidation reaction occurs at 980C for 1.5 hours.

(3) The visible light transmittance of plate glass after coating is slightly reduced.

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